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GRM201 Multi-Stage Roots Dry Vacuum Pump 200 m³/h Oil-Free Compact Vacuum Pump for Semiconductor Clean Process

GRM201 Multi-Stage Roots Dry Vacuum Pump 200 m³/h Oil-Free Compact Vacuum Pump for Semiconductor Clean Process

Product Details:
Place of Origin: China
Brand Name: Baosi
Certification: ISO9001,ISO14001,ISO45001
Model Number: GRM201
Detail Information
Place of Origin:
China
Brand Name:
Baosi
Certification:
ISO9001,ISO14001,ISO45001
Model Number:
GRM201
Pumping Speed:
200 M³/h
Ultimate Pressure:
≤0.5 Pa
Motor Power:
1.9 KW
Voltage:
380V/3-Phase
Inlet:
ISO63
Outlet:
KF25
Noise:
≤63 DB(A)
Weight:
150 Kg
Dimensions:
741×344×466 Mm
Cooling Water:
0.1-0.6 MPa, ≥3 L/min
N2 Purge:
0.2-0.6 MPa, 12-50 L/min
Highlight:

High Light

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GRM201 multi-stage dry vacuum pump

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oil-free compact vacuum pump

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semiconductor clean process vacuum pump

Trading Information
Minimum Order Quantity:
1 Set
Price:
Negotiable
Packaging Details:
Export Standard Wooden Case Packaging
Delivery Time:
15-25 Working Days
Payment Terms:
T/T
Supply Ability:
60 Sets/Month
Product Description

GRM201 Multi-Stage Roots Dry Vacuum Pump — 200 m³/h Compact Oil-Free Solution

The GRM201 is a compact multi-stage roots dry vacuum pump delivering 200 m³/h pumping speed with an ultra-quiet operation at ≤63 dB(A). Its oil-free multi-stage roots design makes it ideal for clean and medium semiconductor processes, photovoltaic manufacturing, and lithium battery production lines that require contamination-free vacuum with minimal footprint.

Key Features

  • Multi-Stage Roots Design: Low power consumption with high pumping efficiency
  • Ultra-Quiet Operation: ≤63 dB(A) — the quietest in its class
  • Oil-Free Mechanism: Pump chamber contains absolutely no oil for clean process compatibility
  • Permanent Magnet Synchronous Motor: 1.9 kW with superior energy efficiency
  • Superior Dust Handling: Advanced rotor structure for enhanced particle exhaust
  • Compact Footprint: Only 741 * 344 * 466 mm, 150 kg — easy to integrate
  • Dust & Vapor Tolerant: Insensitive to process byproducts and moisture
  • Full Protection: Comprehensive safety features with adaptive capability
  • Smart Control: I/O and RS485 (Modbus protocol) for remote monitoring
  • Triple Sealing: Lip seal + labyrinth seal + nitrogen purge for guaranteed oil-free vacuum

Technical Specifications

ModelGRM201
Pumping Speed200 m³/h
Ultimate Pressure (w/o purge)≤0.5 Pa
Motor Power1.9 kW
Voltage380V (3-Phase)
Inlet ConnectionISO63
Outlet ConnectionKF25
Noise Level≤63 dB(A)
Weight150 kg
Dimensions (L*W*H)741 * 344 * 466 mm
Cooling Water Pressure0.1–0.6 MPa
Cooling Water Flow≥3 L/min
N₂ Purge Pressure0.2–0.6 MPa
N₂ Purge Flow12–50 L/min
Operating Temperature5–40°C; ≤90% RH

Applications

  • Semiconductor Clean/Medium Processes: ALD, PECVD, MOCVD, SACVD, RTP, HDP-CVD
  • Photovoltaic: Crystal growth furnaces, solar cell fabrication
  • Lithium Battery: Cell vacuum drying, electrolyte filling, degassing
  • R&D Laboratories: University and industrial research vacuum systems