Home > Products >

GRM1201 Multi-Stage Roots Dry Vacuum Pump 1200 m³/h Oil-Free for Semiconductor PECVD MOCVD

Name: GRM1201 Multi-Stage Roots Dry Vacuum Pump 1200 m³/h Oil-Free for Semiconductor PECVD MOCVD
Brand: Ningbo Baosi Energy Equipment Co., Ltd.
SKU: GRM1201
Price: 10,500.00 USD
Availability: InStock

Product Details:

Place of Origin:	China
Brand Name:	Baosi
Certification:	CE
Model Number:	GRM1201

Detail Information

Place of Origin:

China

Brand Name:

Baosi

Certification:

Model Number:

GRM1201

Pumping Speed:

1200 M³/h

Ultimate Pressure:

≤0.15 Pa

Motor Power:

1.9+1.9 KW

Voltage:

380V/3-Phase

Inlet:

ISO160

Outlet:

KF25

Noise:

≤63 DB(A)

Weight:

260 Kg

Dimensions:

865×344×751 Mm

Cooling Water:

0.1-0.6 MPa, ≥4 L/min

N2 Purge:

0.2-0.6 MPa, 12-50 L/min

Highlight:

High Light

Highlight:

high speed roots vacuum pump

1200m3h dry vacuum pump

PECVD MOCVD process vacuum

Trading Information

Minimum Order Quantity:

1 Set

Price:

USD 8500-12500/Set

Packaging Details:

Export Standard Wooden Case Packaging

Delivery Time:

15-30 Working Days

Payment Terms:

T/T,L/C

Supply Ability:

50 Sets/Month

Product Description

GRM1201 Multi-Stage Roots Dry Vacuum Pump 1200 m³/h Oil-Free High-Speed Vacuum Pump for Semiconductor PECVD MOCVD

GRM1201 Multi-Stage Roots Dry Vacuum Pump — 1200 m³/h High-Speed Solution

The GRM1201 is a high-speed multi-stage roots dry vacuum pump delivering 1200 m³/h pumping speed with ultimate pressure of ≤0.15 Pa. Sharing the same compact platform as the GRM601 (865 * 344 * 751 mm, 260 kg) but with ISO160 inlet for higher throughput, it excels in PECVD, MOCVD and demanding semiconductor clean and medium process applications.

Key Features

High-Speed Multi-Stage Roots: 1200 m³/h with low power consumption
Dual Motor Efficiency: 1.9+1.9 kW permanent magnet synchronous motors
Excellent Ultimate Pressure: ≤0.15 Pa meets demanding process requirements
Ultra-Quiet: ≤63 dB(A) — cleanroom-compatible noise level
Large ISO160 Inlet: Handles high gas throughput for production-scale applications
Oil-Free Clean Vacuum: No oil contamination for sensitive semiconductor processes
Superior Dust Handling: Advanced rotor design for particle-rich environments
Compact Platform: Same footprint as GRM601 — easy line integration
Triple Sealing System: Lip seal + labyrinth + nitrogen purge guarantee oil-free vacuum
Smart Connectivity: I/O and RS485 (Modbus) for remote factory integration

Technical Specifications

Model	GRM1201
Pumping Speed	1200 m³/h
Ultimate Pressure (w/o purge)	≤0.15 Pa
Motor Power	1.9 + 1.9 kW
Voltage	380V (3-Phase)
Inlet Connection	ISO160
Outlet Connection	KF25
Noise Level	≤63 dB(A)
Weight	260 kg
Dimensions (LWH)	865 * 344 * 751 mm
Cooling Water Pressure	0.1–0.6 MPa
Cooling Water Flow	≥4 L/min
N₂ Purge Pressure	0.2–0.6 MPa
N₂ Purge Flow	12–50 L/min
Operating Temperature	5–40°C; ≤90% RH

Applications

Semiconductor: PECVD, MOCVD, SACVD, RTP, HDP-CVD, ALD, Metal Etch, Silicon Etch
Photovoltaic: High-throughput solar cell manufacturing lines
Lithium Battery: Production-scale cell drying and electrolyte processing
Flat Panel Display: OLED and LCD manufacturing

Tags:

GRM1201 Multi-Stage Roots Dry Vacuum Pump 1200 m³/h Oil-Free for Semiconductor PECVD MOCVD

High Light

Highlight:

high speed roots vacuum pump

1200m3h dry vacuum pump

PECVD MOCVD process vacuum

turbo vacuum pump,

high vacuum pump,

high speed roots vacuum pump

Water Cooled Dry Vacuum Pump 1200m³/h,≤0.15Pa,1.9kw,GRM1201

Water Cooled Dry Vacuum Pump 200m³/h,≤0.5Pa,1.9kw,GRM201

Water Cooled Dry Vacuum Pump 600m³/h,≤0.15Pa,1.9kw,GRM601